transistor

At Applied’s 2021 Logic Master Class held today, the company showcased several innovations that help solve key logic scaling challenges and deliver continued improvements in PPACt™ at 3nm and beyond.

At our upcoming Logic Master Class, experts from Applied and the industry will shed light on the innovations needed to enable advanced logic to further scale and deliver improvements in PPACt. In this blog I give a preview of what we’ll be discussing related to transistor design and scaling challenges.

The first material change in the transistor contact and interconnect in 20 years is required to remove a major performance bottleneck between transistors and the outside world.

Applied Materials will be presenting in five sessions at PRiME 2016, one of the largest international research conferences, being held October 2-7 in Honolulu, Hawaii.

Evolutionary changes in materials and device structures critical for next generation of device scaling.

Endura®系统被认为是最成功的ssful metallization tool in the history of the semiconductor industry. Since its introduction, through continuous infusions of new innovations and process technologies, it has enabled customers to advance Moore’s Law from the .75 micron node to today’s sub-20 nanometer nodes, and can continue beyond to sub-10 nanometer designs.To appreciate what made the Endura a truly landmark system, and how the value it provides has been sustained over decades, I'd like to reference the recent VLSIresearch feature and highlight some key points.

Applied Materials' Schubert Chu, Epi Products Head, Silicon Systems Group, discusses how Applied's new epi technology for NMOS transistors increases transistor speed in an interview with Pete Singer, Editor-in-Chief for Solid State Technology.

Even as industry moves into the era of the high k metal gate (HKMG) and FinFET transistor, chipmakers continue to seek ways to improve device performance.

The May 2012 issue of WIRED Magazine features one of Applied Materials’ semiconductor manufacturing systems used to manufacture cutting-edge chips found in today’s electronics. The ‘How it Works’ article illustrates how we can sculpt transistors atom-by-atom.